FERRO-PCM
—
Non-volatile photonic weight cell
·
0 pW static power
·
65 fJ write
·
optically readable at 1550 nm
·
candidate for DRAM-free MVM inference
·
vs DRAM reload: 192 pJ/weight (array-level, not per-read)
Device Cross-Section — Single Cell
FE Polarisation
±Pr → ±σ_b
→
±Pr → ±σ_b
Gate Field
through 1nm Al₂O₃
→
through 1nm Al₂O₃
Graphene E_F
Kubo formalism
→
Kubo formalism
Pauli Blocking
E_F > 0.40 eV → transparent
→
E_F > 0.40 eV → transparent
Optical Weight
evanescent coupling SiN
→
evanescent coupling SiN
MVM Output
Ge PD + 3-bit ADC
Ge PD + 3-bit ADC
Write Bus
METAL INTERCONNECT
V_write pulse
TiN Electrode
TiN — 10 nm
Top electrode
Al:HfO₂ Gate
↑
↑
↑
↑
↑
↑
↑
+Pr → E_F > 0.40 eV
Al₂O₃ Seed
Al₂O₃ — 1 nm
ALD nucleation
Graphene
PAULI BLOCKED — TRANSPARENT
E_F = 0.52 eV
SCD(111)
◆ SINGLE-CRYSTAL DIAMOND (111)
k = 2200 W/m·K — Graphene growth template + thermal spreader
Route F: Ni-catalysed graphitisation — graphene grown IN PLACE on this surface
Bonding Oxide
SiO₂ — 10 nm
δ = 263 nm evanescent
SiN Waveguide
SiN 330 nm × 3 µm — TE₀ @ 1550 nm
IL ≈ 0.1 dB/µm
SiO₂ CLADDING + Ge PHOTODETECTOR + 3-bit ADC
FERMI LEVEL
0.52eV
Blocking threshold: 0.40 eV
CARRIER DENSITY
1.6×10¹³cm⁻²
n_block = 1.18×10¹³ cm⁻²
OPTICAL STATE
PASS
IL ≈ 0.1 dB/µm
EXTINCTION RATIO
3dB/cell
FDTD taper geometry
WRITE ENERGY
0fJ
Xu et al. 2025
RETENTION
10yr
Projected, no opt. load
V_GATE (corrected)
1.49V
Incl. C_Q correction
Controls
Polarisation
+Pr (UP)
Graphene
TRANSPARENT
Weight State
W = 1 (ON)
Static Power
0 pW
Write Operations
Read / Inference
Array Operations
Cumulative Write Energy
Session total
0 fJ
0vs DRAM: 192 pJ/weight
Operation Log
64×64 MVM Tile — 16×16 Display (click cells to toggle)
W=1 Pauli blocked (transparent)
W=0 Absorbing
ON cells
128
OFF cells
128
Array write energy
0 fJ
vs DRAM equivalent
0 pJ
Static inference power
0 pW